Due to the presence of a capable interdisciplinary research team and unique laboratory equipment, the Future Green Microsystems Company helps solve problems in various industries through research projects. The company has so far signed research contracts with Iran Khodro, MAPNA, Mobarakeh Steel, Golgohar Sirjan, Magfa, Jahan Steel, etc. The company also provides laboratory services and training workshops to students and researchers. Research projects that lead to the continuous production of a product will be given priority. The company’s services in this regard include:

-Mask manufacturing

-Sputtering and electrochemical coating

-Microfluidics

-Sacrificial layer and flotation: beam, diaphragm, floating mass manufacturing

mems

Rasa Laboratory Facilities

Surface Profile Gauge

Surface Profile Gauge

Device specifications: Ability to create direct and reverse pulses, maximum current 50 amps
Services that can be provided with this device: Coating of gold, copper, nickel and chromium layers up to a height of 100 microns
Vacuum Desiccator

Vacuum Desiccator

Device specifications: Maximum sample dimensions 10*10*10 cm
Services that can be provided with this device: Dimensional measurement, imaging of microstructures and mechanisms
 
Mask Writer and Non-Contact Projection Lithography

Mask Writer and Non-Contact Projection Lithography

Device specifications: 400 watts of power, 20 kHz frequency, possibility of using corrosive liquids
Services that can be provided with this device: Surface cleaning, ceramic removal, very high-speed removal with corrosive liquids
 
Vacuum Oven

Vacuum Oven

 
Device specifications: Maximum temperature: 200 degrees Celsius, pressure difference 10 mbar, ability to create 4 programs, heating and cooling
Services that can be provided with this device: Removing gas from the structure during heating and drying
DC Magnetron Sputter

DC Magnetron Sputter

Device specifications: Wafer coating up to 4 inches
Services available with this device: Chrome, gold, titanium, copper and nickel coating up to one micron thick
Spin Coater

Spin Coater

Device specifications: Maximum speed 12000RPM (programmable), maximum speed changes and resolution 0.2RPM, maximum wafer diameter 4 inches
Services available with this device: Photoresist coating and polymer layers
3D Printer

3D Printer

Device specifications: Layer thickness 100 microns, maximum print dimensions 40*30*30
Services available with this device: Printing of ABS, PLA, TPU filaments is possible
Rotary Evaporator

Rotary Evaporator

Device specifications: Maximum 210C, Maximum rotation speed 280 rpm
Services that can be provided with this device: Separation of materials with different boiling points, Separation and purification of materials
 
Ultrasonic bath

Ultrasonic bath

Device specifications: Bath volume 20x10x10 cm, ultrasonic head power 20W
Services that can be provided with this device: Surface cleaning, increasing removal speed, homogenizing solutions and dispersing particles
 
Electroplating station

Electroplating station

Device specifications: Ability to create direct and reverse pulses, maximum current 50 amps
Services that can be provided with this device: Gold, copper, nickel and chrome layer deposition up to 100 microns in height
Optical Microscope

Optical Microscope (OM)

Device specifications: Capable of imaging with magnifications of 4X, 10X, 20X, 50X
Services that can be provided with this device: Dimensional measurement, imaging of microstructures and mechanisms
Ultrasonic Etching

Ultrasonic Etching

Device specifications: 400 watts of power, 20 kHz frequency, ability to use corrosive liquids
Services that can be provided with this device: Surface cleaning, ceramic removal, very high-speed removal with corrosive liquids
Wet Etching Station Table

Wet Etching Station Table

Device specifications: Equipped with two acid and base chambers, with piping and DI water chamber, equipped with nitrogen piping
Services that can be provided with this device: Wet removal of Si, SiO2, Si3N4, nickel, copper, gold and chromium
Digital Scale

Digital Scale

Device specifications: Measuring capability with an accuracy of 10 micrograms, maximum measurable weight 200g
Services that can be provided with this device: Accurate weighing of materials and solutions
Lithography

Lithography

Machine specifications: Maximum wafer size 4 inches, maximum photoresist thickness 50 microns
Services available with this machine: Lithography of wafers up to 4 inches